Oxide Scale Behavior in High Temperature Metal Processing
Author | : | |
Rating | : | 4.91 (504 Votes) |
Asin | : | 3527325182 |
Format Type | : | paperback |
Number of Pages | : | 386 Pages |
Publish Date | : | 2018-01-17 |
Language | : | English |
DESCRIPTION:
Each chapter consists of a detailed, systematic examination of different aspects of oxide scale formation with immediate impact for researchers and developers in industry. From the Back Cover The result of a fruitful, on-going collaboration between academia and industry, this book reviews recent advances in research on oxide scale behavior in high-temperature forming processes. The clear and stringent style of presentation makes this monograph both coherent and easily readable.. Presenting novel, previously neglected approaches, the authors emphasize the pivotal role of reproducible experiments to elucidate the oxide scale properties and develop quantitative models with predictive accuracy
Each chapter consists of a detailed, systematic examination of different aspects of oxide scale formation with immediate impact for researchers and developers in industry. The clear and stringent style of presentation makes this monograph both coherent and easily readable.. The result of a fruitful, on-going collaboration between academia and industry, this book reviews recent advances in research on oxide scale behavior in high-temperature forming processes. Presenting novel, previously neglected approaches, the authors emphasize the pivotal role of reproducible experiments to elucidate the oxide scale properties and develop quantitative models with predictive accuracy
In recognition of his achievements, he was awarded the 2008 Dowding Medal and Prize.. Farrugia is currently scientific fellow at Corus Swinden Technology Centre in Rotherham, UK, and a fellow of the Institute of Materials, Minerals and Mining (IOM3). John H. Professor Beynon is a fellow of the Institute of Materials, Minerals and Mining, the Institution of Engineers
"Five Stars" according to Davide Alghisi. Excellent technical book